Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III)
98%
- Product Code: 82710
CAS:
14319-13-2
| Molecular Weight: | 688.72 g./mol | Molecular Formula: | C₃₃H₅₇LaO₆ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00010466 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | Room temperature, airtight, dry |
Product Description:
Used as a precursor in the chemical vapor deposition (CVD) process to produce thin films of lanthanum-containing materials, which are essential in the manufacturing of advanced electronic devices. It plays a crucial role in the development of high-k dielectric materials for capacitors and gate insulators in semiconductors. Additionally, it is employed in the synthesis of luminescent materials and phosphors, contributing to the enhancement of display technologies and lighting systems. Its application extends to catalysis, where it facilitates various organic transformations, improving efficiency and selectivity in chemical reactions.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | $186.13 |
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Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III)
Used as a precursor in the chemical vapor deposition (CVD) process to produce thin films of lanthanum-containing materials, which are essential in the manufacturing of advanced electronic devices. It plays a crucial role in the development of high-k dielectric materials for capacitors and gate insulators in semiconductors. Additionally, it is employed in the synthesis of luminescent materials and phosphors, contributing to the enhancement of display technologies and lighting systems. Its application extends to catalysis, where it facilitates various organic transformations, improving efficiency and selectivity in chemical reactions.
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