4,4'-Sulfonyldiphenol
99%
- Product Code: 126885
Alias:
4,4'-Dihydroxydiphenylsulfone; bisphenol S, 4,4'-sulfonyldiphenol
CAS:
80-09-1
Molecular Weight: | 250.27 g./mol | Molecular Formula: | C₁₂H₁₀O₄S |
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EC Number: | 201-250-5 | MDL Number: | MFCD00002350 |
Melting Point: | Boiling Point: | ||
Density: | Storage Condition: | room temperature |
Product Description:
Used primarily as a key intermediate in the production of high-performance polymers, particularly polyether sulfones (PES) and polysulfones. These polymers are valued for their thermal stability, chemical resistance, and mechanical strength, making them suitable for applications in automotive, aerospace, and electronics industries. It is also employed in the synthesis of flame retardants and as a modifier in epoxy resins to enhance their properties. Additionally, it finds use in the manufacturing of specialty coatings and adhesives, where durability and resistance to harsh environments are critical.
Product Specification:
Test | Specification |
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Melting Point | 245 Degree Celsius-250 Degree Celsius |
Purity (HPLC) | 99%-100% |
Water By Karl Fischer | 0%-1% |
Appearance | White To Tan Or Light Pink Powder Or Crystals |
Infrared Spectrum | Conforms To Structure |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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100.000 | 10-20 days | $18.32 |
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500.000 | 10-20 days | $76.08 |
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2500.000 | 10-20 days | $251.26 |
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10000.000 | 10-20 days | $713.85 |
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4,4'-Sulfonyldiphenol
Used primarily as a key intermediate in the production of high-performance polymers, particularly polyether sulfones (PES) and polysulfones. These polymers are valued for their thermal stability, chemical resistance, and mechanical strength, making them suitable for applications in automotive, aerospace, and electronics industries. It is also employed in the synthesis of flame retardants and as a modifier in epoxy resins to enhance their properties. Additionally, it finds use in the manufacturing of specialty coatings and adhesives, where durability and resistance to harsh environments are critical.
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