Ammonium fluoride
99.9% metals basis
- Product Code: 57906
Alias:
Ammonium fluoride
CAS:
12125-01-8
| Molecular Weight: | 37.04 g./mol | Molecular Formula: | NH₄F |
|---|---|---|---|
| EC Number: | 235-185-9 | MDL Number: | MFCD00011423 |
| Melting Point: | 98°C | Boiling Point: | 65°C/760mmHg |
| Density: | 1.11 g/mL at 20 °C | Storage Condition: | room temperature |
Product Description:
Ammonium fluoride is widely used in various industrial and laboratory applications. It serves as a key component in the production of glass and ceramics, where it acts as an etching agent to create intricate designs or smooth surfaces. In the electronics industry, it is utilized for cleaning and etching silicon wafers during the manufacturing of semiconductors. Additionally, it is employed in wood preservation treatments to protect against fungal decay and insect damage. In analytical chemistry, it is used as a buffering agent and in the preparation of fluoride-containing solutions. Its ability to react with metal oxides also makes it useful in metal surface treatment and cleaning processes.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White crystals |
| PURITY | 99.9 100% |
| X-RAY DIFFRACTION | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 25.000 | 10-20 days | Ft4,201.90 |
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| 100.000 | 10-20 days | Ft11,636.04 |
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| 500.000 | 10-20 days | Ft34,046.18 |
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| 2500.000 | 10-20 days | Ft127,780.92 |
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Ammonium fluoride
Ammonium fluoride is widely used in various industrial and laboratory applications. It serves as a key component in the production of glass and ceramics, where it acts as an etching agent to create intricate designs or smooth surfaces. In the electronics industry, it is utilized for cleaning and etching silicon wafers during the manufacturing of semiconductors. Additionally, it is employed in wood preservation treatments to protect against fungal decay and insect damage. In analytical chemistry, it is used as a buffering agent and in the preparation of fluoride-containing solutions. Its ability to react with metal oxides also makes it useful in metal surface treatment and cleaning processes.
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