BR351 precursor
≥98%
- Product Code: 107906
CAS:
960113-89-7
| Molecular Weight: | 576.68 g./mol | Molecular Formula: | C₂₇H₃₂N₂O₈S₂ |
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| Density: | Storage Condition: | 2-8°C, sealed, dry |
Product Description:
BR351 precursor is primarily used in the development of advanced photoresist materials, which are essential in semiconductor manufacturing. Its application is critical in photolithography processes, where it helps create precise patterns on silicon wafers for integrated circuits and microchips. The precursor contributes to the formation of high-resolution images, enabling the production of smaller and more efficient electronic components. It is particularly valued for its ability to enhance the performance of photoresists in extreme ultraviolet (EUV) lithography, a cutting-edge technology used in the fabrication of next-generation semiconductor devices. This makes it a key component in the electronics industry, supporting the miniaturization and increased functionality of modern technology.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.005 | 10-20 days | $1,056.69 |
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BR351 precursor
BR351 precursor is primarily used in the development of advanced photoresist materials, which are essential in semiconductor manufacturing. Its application is critical in photolithography processes, where it helps create precise patterns on silicon wafers for integrated circuits and microchips. The precursor contributes to the formation of high-resolution images, enabling the production of smaller and more efficient electronic components. It is particularly valued for its ability to enhance the performance of photoresists in extreme ultraviolet (EUV) lithography, a cutting-edge technology used in the fabrication of next-generation semiconductor devices. This makes it a key component in the electronics industry, supporting the miniaturization and increased functionality of modern technology.
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