Tantalum(V) Ethoxide
99%
- Product Code: 121980
Alias:
Tantalum Ethanol, Tantalum Pentaethoxide
CAS:
6074-84-6
| Molecular Weight: | 406.25 g./mol | Molecular Formula: | C₁₀H₂₅O₅Ta |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00049785 | |
| Melting Point: | 21°C (Lit.) | Boiling Point: | 155°C 0.01mm Hg (Lit.) |
| Density: | 1.5700g/ml | Storage Condition: | 2-8°C |
Product Description:
Tantalum(V) Ethoxide is widely used in the field of materials science, particularly in the production of thin films and coatings. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create high-quality tantalum oxide layers, which are essential in semiconductor manufacturing for insulating layers in electronic devices. Additionally, it is employed in the synthesis of advanced ceramics and nanocomposites, where its properties contribute to enhanced thermal and chemical stability. In catalysis, Tantalum(V) Ethoxide acts as a catalyst or catalyst support in organic transformations, including polymerization and oxidation reactions, due to its ability to facilitate precise control over reaction conditions. Its application extends to optical coatings, where it is used to produce layers with specific refractive indices for use in lenses, mirrors, and other optical components.
Product Specification:
| Test | Specification |
|---|---|
| Purity (%) | 99 |
| Melting Point (Degree Celsius) | 18-21 |
| Refractive Index N20/D | 1.486-1.488 |
| Appearance | Colorless To Pale Yellow Liquid |
| Note | This Product Is Low Melting Point Solid, May Change State In Different Environments (Solid, Liquid Or Semi-Solid) |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | $38.70 |
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| 5.000 | 10-20 days | $149.71 |
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| 25.000 | 10-20 days | $608.76 |
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Tantalum(V) Ethoxide
Tantalum(V) Ethoxide is widely used in the field of materials science, particularly in the production of thin films and coatings. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create high-quality tantalum oxide layers, which are essential in semiconductor manufacturing for insulating layers in electronic devices. Additionally, it is employed in the synthesis of advanced ceramics and nanocomposites, where its properties contribute to enhanced thermal and chemical stability. In catalysis, Tantalum(V) Ethoxide acts as a catalyst or catalyst support in organic transformations, including polymerization and oxidation reactions, due to its ability to facilitate precise control over reaction conditions. Its application extends to optical coatings, where it is used to produce layers with specific refractive indices for use in lenses, mirrors, and other optical components.
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