Nonafluorobutane-1-sulfonic acid
98%
- Product Code: 122149
Alias:
Nonafluoro-1-butanesulfonic acid
CAS:
375-73-5
Molecular Weight: | 300.1 g./mol | Molecular Formula: | CF₃CF₂₃SO₃H |
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EC Number: | 206-793-1 | MDL Number: | MFCD01320794 |
Melting Point: | Boiling Point: | 112-114 °C14 mm Hg(lit.) | |
Density: | 1.811 g/mL at 25 °C(lit.) | Storage Condition: | room temperature |
Product Description:
Used primarily as a surfactant and emulsifier in various industrial processes. It is effective in stabilizing emulsions and improving the wetting properties of coatings and adhesives. In electronics, it serves as a key component in the formulation of etching agents and cleaning solutions for semiconductor manufacturing. Additionally, it is utilized in the production of specialized polymers and fluorinated compounds, enhancing their thermal and chemical resistance. Its unique properties make it valuable in applications requiring high-performance materials and precision cleaning.
Product Specification:
Test | Specification |
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Purity (Neutralization Titration) | 98-100 |
Refractive Index N20/D | 1.32-1.329 |
Appearance | Colorless Liquid |
Fluorine NMR Spectra | Conforms To Structure |
Infrared Spectrum | Conforms To Structure |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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5.000 | 10-20 days | $23.95 |
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25.000 | 10-20 days | $86.88 |
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100.000 | 10-20 days | $262.06 |
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500.000 | 10-20 days | $1,003.15 |
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Nonafluorobutane-1-sulfonic acid
Used primarily as a surfactant and emulsifier in various industrial processes. It is effective in stabilizing emulsions and improving the wetting properties of coatings and adhesives. In electronics, it serves as a key component in the formulation of etching agents and cleaning solutions for semiconductor manufacturing. Additionally, it is utilized in the production of specialized polymers and fluorinated compounds, enhancing their thermal and chemical resistance. Its unique properties make it valuable in applications requiring high-performance materials and precision cleaning.
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