Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)iron(III)
98%
- Product Code: 52484
CAS:
14876-47-2
| Molecular Weight: | 605.6500 g./mol | Molecular Formula: | C₃₃H₅₇FeO₆ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00067465 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2-8°C |
Product Description:
This compound is primarily used as a precursor in the synthesis of iron-containing nanomaterials and thin films. It is particularly valuable in chemical vapor deposition (CVD) processes, where it facilitates the production of high-purity iron oxide films or nanoparticles. These materials are essential in various industries, including electronics, where they are used in magnetic storage devices, sensors, and catalysts. Additionally, it finds application in research for developing advanced materials with specific magnetic or catalytic properties. Its stability and volatility make it suitable for precise and controlled deposition processes in nanotechnology and materials science.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Yellow to orange Solid |
| PURITY | 97.5-100 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.100 | 10-20 days | $12.00 |
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| 0.250 | 10-20 days | $26.40 |
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| 1.000 | 10-20 days | $77.41 |
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Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)iron(III)
This compound is primarily used as a precursor in the synthesis of iron-containing nanomaterials and thin films. It is particularly valuable in chemical vapor deposition (CVD) processes, where it facilitates the production of high-purity iron oxide films or nanoparticles. These materials are essential in various industries, including electronics, where they are used in magnetic storage devices, sensors, and catalysts. Additionally, it finds application in research for developing advanced materials with specific magnetic or catalytic properties. Its stability and volatility make it suitable for precise and controlled deposition processes in nanotechnology and materials science.
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