Bis(hexafluoroacetylacetonato)nickel(II) hydrate

96%

  • Product Code: 68449
  Alias:    Bis(hexafluoroethylacetone)nickel(II) hydrate
  CAS:    14949-69-0
Molecular Weight: 472.79 g./mol Molecular Formula: C₁₀H₂F₁₂NiO₄H₂O
EC Number: MDL Number:
Melting Point: 211-213°C Boiling Point:
Density: Storage Condition: room temperature
Product Description: This chemical is primarily used in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create nickel-containing films. These films are essential in the production of electronic components, such as semiconductors and sensors, due to their conductive and catalytic properties. Additionally, it is employed in research and development for creating advanced materials with specific magnetic or electronic characteristics. Its stability and reactivity under controlled conditions make it a valuable compound in nanotechnology and surface coating applications.
Product Specification:
Test Specification
PURITYCHELATOMETRIC TITRATION 95.5-104.5
WATER BY KARL FISCHER 0-13
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
1.000 10-20 days $103.03
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-
5.000 10-20 days $334.27
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Bis(hexafluoroacetylacetonato)nickel(II) hydrate
This chemical is primarily used in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create nickel-containing films. These films are essential in the production of electronic components, such as semiconductors and sensors, due to their conductive and catalytic properties. Additionally, it is employed in research and development for creating advanced materials with specific magnetic or electronic characteristics. Its stability and reactivity under controlled conditions make it a valuable compound in nanotechnology and surface coating applications.
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