Nickel(II) hexafluoroacetylacetonate hydrate
98%
- Product Code: 68450
CAS:
207569-13-9
| Molecular Weight: | 472.79 g./mol | Molecular Formula: | C₁₀H₄F₁₂NiO₅ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00150916 | |
| Melting Point: | 213 °C - lit | Boiling Point: | |
| Density: | Storage Condition: | Room temperature, sealed, dry |
Product Description:
Used primarily in the chemical vapor deposition (CVD) process to produce thin films of nickel-containing materials, which are essential in the manufacturing of semiconductors and electronic devices. It serves as a precursor for depositing nickel layers that enhance conductivity and corrosion resistance in microelectronic components. Additionally, it is employed in the synthesis of catalysts for organic reactions, particularly in cross-coupling and hydrogenation processes, due to its stability and reactivity. In materials science, it contributes to the development of advanced coatings and nanocomposites with tailored properties for industrial applications.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | Ft31,029.43 |
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Nickel(II) hexafluoroacetylacetonate hydrate
Used primarily in the chemical vapor deposition (CVD) process to produce thin films of nickel-containing materials, which are essential in the manufacturing of semiconductors and electronic devices. It serves as a precursor for depositing nickel layers that enhance conductivity and corrosion resistance in microelectronic components. Additionally, it is employed in the synthesis of catalysts for organic reactions, particularly in cross-coupling and hydrogenation processes, due to its stability and reactivity. In materials science, it contributes to the development of advanced coatings and nanocomposites with tailored properties for industrial applications.
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