Tetrakis(dimethylamino)titanium(IV)
≥97%
- Product Code: 68474
CAS:
3275-24-9
| Molecular Weight: | 224.18 g./mol | Molecular Formula: | C₈H₂₄N₄Ti |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00014861 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | Room temperature, dry, sealed, stored in nitrogen |
Product Description:
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for depositing titanium-containing thin films. These films are essential in semiconductor manufacturing, particularly for creating high-k dielectric materials in advanced microelectronics. It also plays a role in the production of titanium nitride coatings, which are applied to improve wear resistance and durability in cutting tools and mechanical components. Additionally, it is utilized in research and development for synthesizing novel titanium-based materials with potential applications in catalysis and energy storage.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Light yellow to Brown clear liquid |
| PURITY | 96.5-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | $53.48 |
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| 1.000 | 10-20 days | $180.90 |
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| 5.000 | 10-20 days | $632.36 |
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Tetrakis(dimethylamino)titanium(IV)
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for depositing titanium-containing thin films. These films are essential in semiconductor manufacturing, particularly for creating high-k dielectric materials in advanced microelectronics. It also plays a role in the production of titanium nitride coatings, which are applied to improve wear resistance and durability in cutting tools and mechanical components. Additionally, it is utilized in research and development for synthesizing novel titanium-based materials with potential applications in catalysis and energy storage.
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