Tetrakis(dimethylamino)titanium(IV)
99.9% metals basis
- Product Code: 68475
Alias:
TDMAT;Tetrakis(dimethylamino)titanium(IV);Tetrakis(dimethylamino)titanium
CAS:
3275-24-9
| Molecular Weight: | 224.18 g./mol | Molecular Formula: | C₈H₂₄N₄Ti |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00014861 | |
| Melting Point: | 4 °C | Boiling Point: | 50 °C/0.5 mmHg (lit.) |
| Density: | 0.947 g/mL at 25 °C (lit.) | Storage Condition: | Room temperature, dry, sealed, inert gas |
Product Description:
Tetrakis(dimethylamino)titanium(IV) is primarily used in the field of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It serves as a precursor for depositing titanium-containing thin films, which are essential in the semiconductor industry for manufacturing integrated circuits and other electronic components. The compound is particularly valued for its ability to form high-purity titanium nitride (TiN) films, which are used as diffusion barriers and conductive layers in microelectronic devices. Additionally, it is employed in the production of optical coatings and as a catalyst in various organic synthesis reactions, contributing to the development of advanced materials and chemical products.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | €315.79 |
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Tetrakis(dimethylamino)titanium(IV)
Tetrakis(dimethylamino)titanium(IV) is primarily used in the field of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It serves as a precursor for depositing titanium-containing thin films, which are essential in the semiconductor industry for manufacturing integrated circuits and other electronic components. The compound is particularly valued for its ability to form high-purity titanium nitride (TiN) films, which are used as diffusion barriers and conductive layers in microelectronic devices. Additionally, it is employed in the production of optical coatings and as a catalyst in various organic synthesis reactions, contributing to the development of advanced materials and chemical products.
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