10,12-Docosadiynedioic acid
95%
- Product Code: 78516
CAS:
28393-02-4
| Molecular Weight: | 362.51 g./mol | Molecular Formula: | C₂₂H₃₄O₄ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00078306 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | Room temperature, airtight, dry |
Product Description:
This chemical is primarily used in the field of material science, particularly in the development of advanced polymers and coatings. Its unique structure allows it to form stable, cross-linked networks, making it valuable for creating durable and high-performance materials. It is often employed in the synthesis of self-assembled monolayers (SAMs) for surface modification, enhancing properties like corrosion resistance, adhesion, and biocompatibility. Additionally, it finds applications in the production of photoresists for microfabrication processes in the electronics industry. Its ability to undergo photopolymerization makes it suitable for creating precise patterns in nanotechnology and photolithography.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Very pale blue to blue to grey Crystals or powder or crystalline powder |
| PURITY | 94.5-100 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.050 | 10-20 days | €36.67 |
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| 0.250 | 10-20 days | €126.37 |
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10,12-Docosadiynedioic acid
This chemical is primarily used in the field of material science, particularly in the development of advanced polymers and coatings. Its unique structure allows it to form stable, cross-linked networks, making it valuable for creating durable and high-performance materials. It is often employed in the synthesis of self-assembled monolayers (SAMs) for surface modification, enhancing properties like corrosion resistance, adhesion, and biocompatibility. Additionally, it finds applications in the production of photoresists for microfabrication processes in the electronics industry. Its ability to undergo photopolymerization makes it suitable for creating precise patterns in nanotechnology and photolithography.
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