1,1,2,2-Tetrachloro-1,2-dimethyldisilane
≥98%
- Product Code: 88060
CAS:
4518-98-3
| Molecular Weight: | 228.04 g./mol | Molecular Formula: | C₂H₆Cl₄Si₂ |
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| EC Number: | MDL Number: | MFCD00192469 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2~8℃, sealed |
Product Description:
This chemical is primarily used in the semiconductor industry as a precursor for depositing silicon-containing thin films. It plays a crucial role in chemical vapor deposition (CVD) processes, where it helps in the formation of silicon carbide or silicon nitride layers, which are essential for enhancing the performance and durability of electronic devices. Additionally, it is employed in the synthesis of organosilicon compounds, which are widely used in the production of silicones, resins, and other specialty materials. Its applications also extend to research and development in advanced material sciences, particularly in creating coatings with high thermal and chemical resistance.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | $158.21 |
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| 5.000 | 10-20 days | $621.55 |
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1,1,2,2-Tetrachloro-1,2-dimethyldisilane
This chemical is primarily used in the semiconductor industry as a precursor for depositing silicon-containing thin films. It plays a crucial role in chemical vapor deposition (CVD) processes, where it helps in the formation of silicon carbide or silicon nitride layers, which are essential for enhancing the performance and durability of electronic devices. Additionally, it is employed in the synthesis of organosilicon compounds, which are widely used in the production of silicones, resins, and other specialty materials. Its applications also extend to research and development in advanced material sciences, particularly in creating coatings with high thermal and chemical resistance.
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