Triisopropylsilyl Methacrylate
98%
- Product Code: 88303
CAS:
134652-60-1
| Molecular Weight: | 242.43 g./mol | Molecular Formula: | C₁₃H₂₆O₂Si |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2~8℃ |
Product Description:
Triisopropylsilyl methacrylate is widely used in the field of polymer chemistry, particularly in the synthesis of advanced materials. It serves as a key monomer in the production of specialty polymers with tailored properties, such as enhanced thermal stability and chemical resistance. The compound is often employed in the creation of protective coatings and films, where its silyl group contributes to improved adhesion and durability on various substrates. Additionally, it is utilized in the development of photoresists for microelectronics and semiconductor manufacturing, enabling precise patterning during lithography processes. Its unique structure also makes it valuable in organic synthesis, where it acts as a protecting group for hydroxyl functionalities in complex molecule construction.
Product Specification:
| Test | Specification |
|---|---|
| Purity | 97.5 100% |
| APPEARANCE | COLORLESS CLEAR LIQUID |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | €86.53 |
+
-
|
| 5.000 | 10-20 days | €293.90 |
+
-
|
| 25.000 | 10-20 days | €817.84 |
+
-
|
Triisopropylsilyl Methacrylate
Triisopropylsilyl methacrylate is widely used in the field of polymer chemistry, particularly in the synthesis of advanced materials. It serves as a key monomer in the production of specialty polymers with tailored properties, such as enhanced thermal stability and chemical resistance. The compound is often employed in the creation of protective coatings and films, where its silyl group contributes to improved adhesion and durability on various substrates. Additionally, it is utilized in the development of photoresists for microelectronics and semiconductor manufacturing, enabling precise patterning during lithography processes. Its unique structure also makes it valuable in organic synthesis, where it acts as a protecting group for hydroxyl functionalities in complex molecule construction.
| Mechanism | - |
| Appearance | - |
| Longevity | - |
| Strength | - |
| Storage | - |
| Shelf Life | - |
| Allergen(s) | - |
| Dosage (Range) | - |
| Recommended Dosage | - |
| Dosage (Per Day) | - |
| Recommended Dosage (Per Day) | - |
| Mix Method | - |
| Heat Resistance | - |
| Stable in pH range | - |
| Solubility | - |
| Product Types | - |
| INCI | - |
Cart
No products
Subtotal:
€0.00
€0.00
Total :