tri-iso-Propylsilanol
98%
- Product Code: 88307
CAS:
17877-23-5
| Molecular Weight: | 174.36 g./mol | Molecular Formula: | C₉H₂₂OSi |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD01863576 | |
| Melting Point: | Boiling Point: | ||
| Density: | 0.878 g/mL at 25 °C(lit.) | Storage Condition: | 2~8℃, dry, sealed |
Product Description:
Tri-iso-propylsilanol is primarily used in the synthesis of organosilicon compounds, where it serves as a key intermediate. Its application is significant in the production of silane coupling agents, which are essential for improving the adhesion between organic and inorganic materials in composites, coatings, and adhesives. Additionally, it is utilized in the modification of surfaces to enhance their hydrophobicity, making it valuable in water-repellent coatings and protective layers. In the field of electronics, it contributes to the development of dielectric materials and insulating layers, which are crucial for semiconductor devices. Its role in chemical vapor deposition (CVD) processes also makes it important for creating thin films with specific properties.
Product Specification:
| Test | Specification |
|---|---|
| Purity | 97.5 100% |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | $79.37 |
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| 5.000 | 10-20 days | $317.48 |
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| 25.000 | 10-20 days | $840.66 |
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tri-iso-Propylsilanol
Tri-iso-propylsilanol is primarily used in the synthesis of organosilicon compounds, where it serves as a key intermediate. Its application is significant in the production of silane coupling agents, which are essential for improving the adhesion between organic and inorganic materials in composites, coatings, and adhesives. Additionally, it is utilized in the modification of surfaces to enhance their hydrophobicity, making it valuable in water-repellent coatings and protective layers. In the field of electronics, it contributes to the development of dielectric materials and insulating layers, which are crucial for semiconductor devices. Its role in chemical vapor deposition (CVD) processes also makes it important for creating thin films with specific properties.
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