octachlorotrisilane
96%
- Product Code: 88472
CAS:
13596-23-1
| Molecular Weight: | 367.88 g./mol | Molecular Formula: | Cl₈Si₃ |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | -67 °C | Boiling Point: | 211.4 °C (estimate) |
| Density: | 1.588 (estimate) | Storage Condition: | 2-8°C, sealed, dry |
Product Description:
Octachlorotrisilane is primarily used in the semiconductor industry as a precursor for depositing silicon-containing thin films. It plays a crucial role in chemical vapor deposition (CVD) processes, where it helps in the formation of silicon nitride or silicon oxide layers on substrates. These layers are essential for insulating and protecting electronic components in integrated circuits. Additionally, it is employed in the production of high-purity silicon for advanced materials and coatings. Its reactivity with other compounds makes it valuable in synthesizing specialized silicon-based polymers and ceramics, which are used in high-performance applications.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Light yellow to Yellow Liquid |
| PURITY | 95.5-100 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | $1,245.04 |
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octachlorotrisilane
Octachlorotrisilane is primarily used in the semiconductor industry as a precursor for depositing silicon-containing thin films. It plays a crucial role in chemical vapor deposition (CVD) processes, where it helps in the formation of silicon nitride or silicon oxide layers on substrates. These layers are essential for insulating and protecting electronic components in integrated circuits. Additionally, it is employed in the production of high-purity silicon for advanced materials and coatings. Its reactivity with other compounds makes it valuable in synthesizing specialized silicon-based polymers and ceramics, which are used in high-performance applications.
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