3,6-Dichlorotrimellitic anhydride
97%
- Product Code: 99269
Alias:
4,7-Dichloro-1,3-dihydro-1,3-dioxo-1,3-dihydro-5-isobenzofurancarboxylic acid
CAS:
81742-10-1
| Molecular Weight: | 261.02 g./mol | Molecular Formula: | C₉H₂Cl₂O₅ |
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| EC Number: | MDL Number: | MFCD28962732 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2-8℃ |
Product Description:
This chemical is primarily used as an intermediate in the synthesis of high-performance polymers, particularly polyimides. These polymers are valued for their thermal stability, mechanical strength, and chemical resistance, making them suitable for applications in the electronics industry, such as in the production of flexible printed circuit boards and insulating films. Additionally, it is employed in the manufacture of advanced coatings and adhesives that require durability under extreme conditions. Its role in creating heat-resistant materials also extends to aerospace and automotive industries, where it contributes to the development of components that can withstand high temperatures and harsh environments.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
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| 0.010 | 10-20 days | €70.76 |
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| 0.050 | 10-20 days | €94.50 |
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| 0.100 | 10-20 days | €143.89 |
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| 0.250 | 10-20 days | €260.71 |
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3,6-Dichlorotrimellitic anhydride
This chemical is primarily used as an intermediate in the synthesis of high-performance polymers, particularly polyimides. These polymers are valued for their thermal stability, mechanical strength, and chemical resistance, making them suitable for applications in the electronics industry, such as in the production of flexible printed circuit boards and insulating films. Additionally, it is employed in the manufacture of advanced coatings and adhesives that require durability under extreme conditions. Its role in creating heat-resistant materials also extends to aerospace and automotive industries, where it contributes to the development of components that can withstand high temperatures and harsh environments.
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