TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ALUMINUM

98%

  • Product Code: 54737
  CAS:    14319-08-5
Molecular Weight: 576.78 g./mol Molecular Formula: C₃₃H₅₇AlO₆
EC Number: MDL Number:
Melting Point: 264-267℃ Boiling Point: >400℃ at 760 mmHg
Density: Storage Condition: room temperature
Product Description: Used as a precursor in the chemical vapor deposition (CVD) process to produce thin films of aluminum oxide, which are essential in semiconductor manufacturing and protective coatings. It also serves as a catalyst in organic synthesis, particularly in polymerization reactions, due to its stability and reactivity. Additionally, it is employed in the production of advanced materials, such as ceramics and nanocomposites, where precise control over aluminum content is required. Its role in creating high-performance optical coatings is also notable, enhancing the durability and efficiency of optical devices.
Product Specification:
Test Specification
APPEARANCE White to yellow Solid
PURITY 97.5-100
Infrared spectrum Conforms to Structure
NMR Conforms to Structure
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
1.000 10-20 days ฿2,980.00
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5.000 10-20 days ฿11,800.00
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TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ALUMINUM
Used as a precursor in the chemical vapor deposition (CVD) process to produce thin films of aluminum oxide, which are essential in semiconductor manufacturing and protective coatings. It also serves as a catalyst in organic synthesis, particularly in polymerization reactions, due to its stability and reactivity. Additionally, it is employed in the production of advanced materials, such as ceramics and nanocomposites, where precise control over aluminum content is required. Its role in creating high-performance optical coatings is also notable, enhancing the durability and efficiency of optical devices.
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