Diphenyl(vinyl)sulfonium trifluoromethanesulfonate
97%
- Product Code: 59294
CAS:
247129-88-0
| Molecular Weight: | 362.39 g./mol | Molecular Formula: | C₁₅H₁₃F₃O₃S₂ |
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| EC Number: | MDL Number: | MFCD22123284 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature |
Product Description:
Used as a key reagent in photopolymerization processes, particularly in the production of high-resolution imaging materials. It acts as a photoacid generator, releasing strong acids upon exposure to UV light, which initiates the polymerization of monomers. This makes it valuable in the manufacturing of advanced photoresists for microelectronics and semiconductor industries. Additionally, it is employed in the development of coatings, adhesives, and inks that require precise curing under light exposure. Its efficiency in generating reactive species under controlled conditions also makes it suitable for research in organic synthesis and material science.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
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| 0.250 | 10-20 days | ฿1,161.00 |
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| 1.000 | 10-20 days | ฿3,258.00 |
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| 5.000 | 10-20 days | ฿11,070.00 |
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Diphenyl(vinyl)sulfonium trifluoromethanesulfonate
Used as a key reagent in photopolymerization processes, particularly in the production of high-resolution imaging materials. It acts as a photoacid generator, releasing strong acids upon exposure to UV light, which initiates the polymerization of monomers. This makes it valuable in the manufacturing of advanced photoresists for microelectronics and semiconductor industries. Additionally, it is employed in the development of coatings, adhesives, and inks that require precise curing under light exposure. Its efficiency in generating reactive species under controlled conditions also makes it suitable for research in organic synthesis and material science.
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