Bis(4-bromophenyl)iodonium Trifluoromethanesulfonate
≥98%
- Product Code: 60063
CAS:
139139-81-4
| Molecular Weight: | 587.97 g./mol | Molecular Formula: | C₁₃H₈Br₂F₃IO₃S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD21608478 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature, dry |
Product Description:
This chemical is widely used in the field of organic synthesis, particularly as a photoacid generator (PAG) in photolithography processes. It plays a critical role in the production of semiconductors and microelectronics, where it helps create precise patterns on silicon wafers. When exposed to light, it releases strong acids that catalyze the polymerization or cross-linking of photoresist materials, enabling the fabrication of intricate electronic components. Additionally, it is employed in the synthesis of complex organic molecules, serving as a reagent in various coupling reactions. Its stability and efficiency make it a valuable tool in advanced manufacturing and research applications.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White to Almost white powder to crystal |
| PURITY | 97.5-100 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | $148.21 |
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Bis(4-bromophenyl)iodonium Trifluoromethanesulfonate
This chemical is widely used in the field of organic synthesis, particularly as a photoacid generator (PAG) in photolithography processes. It plays a critical role in the production of semiconductors and microelectronics, where it helps create precise patterns on silicon wafers. When exposed to light, it releases strong acids that catalyze the polymerization or cross-linking of photoresist materials, enabling the fabrication of intricate electronic components. Additionally, it is employed in the synthesis of complex organic molecules, serving as a reagent in various coupling reactions. Its stability and efficiency make it a valuable tool in advanced manufacturing and research applications.
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