1-(4-(Trifluoromethyl)phenyl)-1H-pyrrole-2,5-dione

97%

  • Product Code: 63783
  CAS:    54647-09-5
Molecular Weight: 241.17 g./mol Molecular Formula: C₁₁H₆F₃NO₂
EC Number: MDL Number: MFCD00525927
Melting Point: Boiling Point:
Density: Storage Condition: Room temperature, dry, sealed
Product Description: This chemical is primarily utilized in organic synthesis and material science. It serves as a key intermediate in the production of advanced polymers and coatings, particularly those requiring enhanced thermal stability and chemical resistance. Its unique structure, featuring a trifluoromethyl group, makes it valuable in the development of specialty chemicals for electronics, where it contributes to the creation of high-performance dielectric materials. Additionally, it is employed in pharmaceutical research for designing novel drug candidates, especially in the development of anti-inflammatory and antimicrobial agents. Its role in crosslinking reactions also makes it useful in the formulation of adhesives and sealants, improving their durability and performance under harsh conditions.
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
0.100 10-20 days ฿1,350.00
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0.250 10-20 days ฿2,286.00
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1.000 10-20 days ฿5,130.00
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1-(4-(Trifluoromethyl)phenyl)-1H-pyrrole-2,5-dione
This chemical is primarily utilized in organic synthesis and material science. It serves as a key intermediate in the production of advanced polymers and coatings, particularly those requiring enhanced thermal stability and chemical resistance. Its unique structure, featuring a trifluoromethyl group, makes it valuable in the development of specialty chemicals for electronics, where it contributes to the creation of high-performance dielectric materials. Additionally, it is employed in pharmaceutical research for designing novel drug candidates, especially in the development of anti-inflammatory and antimicrobial agents. Its role in crosslinking reactions also makes it useful in the formulation of adhesives and sealants, improving their durability and performance under harsh conditions.
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