Tris(dimethylamido)aluminum(III)
- Product Code: 68368
CAS:
32093-39-3
| Molecular Weight: | 159.21 g./mol | Molecular Formula: | C₆H₁₈AlN₃ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00269811 | |
| Melting Point: | 82-84 °C(lit.) | Boiling Point: | 90℃/0.05mm subl. |
| Density: | 0.865 g/mL at 25 °C(lit.) | Storage Condition: | room temperature |
Product Description:
Used as a precursor in the production of thin films and coatings, particularly in the semiconductor industry. It is essential in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create high-quality aluminum nitride and aluminum oxide films. These films are critical for manufacturing advanced electronic devices, including LEDs, transistors, and integrated circuits. Additionally, it plays a role in the synthesis of specialty chemicals and catalysts, aiding in various organic transformations. Its application extends to the development of optical materials and protective coatings, enhancing durability and performance in high-tech industries.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 10.000 | 10-20 days | ฿44,586.00 |
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Tris(dimethylamido)aluminum(III)
Used as a precursor in the production of thin films and coatings, particularly in the semiconductor industry. It is essential in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create high-quality aluminum nitride and aluminum oxide films. These films are critical for manufacturing advanced electronic devices, including LEDs, transistors, and integrated circuits. Additionally, it plays a role in the synthesis of specialty chemicals and catalysts, aiding in various organic transformations. Its application extends to the development of optical materials and protective coatings, enhancing durability and performance in high-tech industries.
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