[Ethane-1,2-diylbis(oxybenzene-4,1-diyl)]bis(phenylmethanone)
95%
- Product Code: 82708
CAS:
5410-01-5
| Molecular Weight: | 422.4719 g./mol | Molecular Formula: | C₂₈H₂₂O₄ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD27977421 | |
| Melting Point: | Boiling Point: | 612.5 °C at 760 mmHg | |
| Density: | Storage Condition: | room temperature |
Product Description:
This chemical is primarily utilized in the field of polymer science and material engineering. It serves as a key intermediate in the synthesis of high-performance polymers, particularly polyetherketones (PEKs) and polyetheretherketones (PEEKs). These polymers are known for their exceptional thermal stability, mechanical strength, and chemical resistance, making them suitable for demanding applications in aerospace, automotive, and electronics industries. Additionally, it is used in the production of specialty coatings and adhesives that require durability and resistance to harsh environments. Its role in creating advanced materials underscores its importance in developing innovative solutions for industrial and technological challenges.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | ฿11,520.00 |
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| 1.000 | 10-20 days | ฿35,343.00 |
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[Ethane-1,2-diylbis(oxybenzene-4,1-diyl)]bis(phenylmethanone)
This chemical is primarily utilized in the field of polymer science and material engineering. It serves as a key intermediate in the synthesis of high-performance polymers, particularly polyetherketones (PEKs) and polyetheretherketones (PEEKs). These polymers are known for their exceptional thermal stability, mechanical strength, and chemical resistance, making them suitable for demanding applications in aerospace, automotive, and electronics industries. Additionally, it is used in the production of specialty coatings and adhesives that require durability and resistance to harsh environments. Its role in creating advanced materials underscores its importance in developing innovative solutions for industrial and technological challenges.
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