As solution
100µg/ml,5% HNO3
- Product Code: 93490
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|---|---|---|---|
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| Density: | Storage Condition: | 2~8 ℃ |
Product Description:
This solution is widely used in the semiconductor industry for doping silicon wafers to modify their electrical properties. It plays a crucial role in the production of integrated circuits and microelectronics by creating n-type semiconductors. Additionally, it is utilized in the manufacturing of optoelectronic devices, such as LEDs and laser diodes, to enhance their performance. In metallurgy, it is employed as an alloying agent to improve the strength and corrosion resistance of certain metals. It also finds application in research laboratories for synthesizing various arsenic-containing compounds and studying their properties.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | LIQUID |
| CONCENTRATION | 98-102 |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 50.000 | 10-20 days | ฿1,790.00 |
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| 100.000 | 10-20 days | ฿3,360.00 |
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| 500.000 | 10-20 days | ฿16,200.00 |
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As solution
This solution is widely used in the semiconductor industry for doping silicon wafers to modify their electrical properties. It plays a crucial role in the production of integrated circuits and microelectronics by creating n-type semiconductors. Additionally, it is utilized in the manufacturing of optoelectronic devices, such as LEDs and laser diodes, to enhance their performance. In metallurgy, it is employed as an alloying agent to improve the strength and corrosion resistance of certain metals. It also finds application in research laboratories for synthesizing various arsenic-containing compounds and studying their properties.
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