1-Naphthyl diphenylsulfonium triflate
- Product Code: 73265
CAS:
116808-69-6
Molecular Weight: | 450.49 g./mol | Molecular Formula: | C₂₂H₁₇F₃O₃S₂ |
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EC Number: | MDL Number: | MFCD04038883 | |
Melting Point: | 132 - 136 °C - lit. | Boiling Point: | |
Density: | 1.3 g/cm3 | Storage Condition: | room temperature |
Product Description:
Used primarily as a photoacid generator (PAG) in photolithography processes within the semiconductor industry. It generates acid upon exposure to ultraviolet (UV) light, which is essential for patterning microelectronic devices. Its high sensitivity and efficiency make it suitable for advanced photoresist formulations. Additionally, it is employed in the production of high-resolution displays and printed circuit boards. The compound’s stability and performance under UV exposure contribute to its effectiveness in fine-scale manufacturing processes.
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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0.050 | 10-20 days | €42.26 |
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0.250 | 10-20 days | €125.60 |
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1-Naphthyl diphenylsulfonium triflate
Used primarily as a photoacid generator (PAG) in photolithography processes within the semiconductor industry. It generates acid upon exposure to ultraviolet (UV) light, which is essential for patterning microelectronic devices. Its high sensitivity and efficiency make it suitable for advanced photoresist formulations. Additionally, it is employed in the production of high-resolution displays and printed circuit boards. The compound’s stability and performance under UV exposure contribute to its effectiveness in fine-scale manufacturing processes.
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