Tetrakis(ethylmethylamino)zirconium(IV)
≥99.99% trace metals basis
- Product Code: 91292
CAS:
175923-04-3
| Molecular Weight: | 323.63 g./mol | Molecular Formula: | C₁₂H₃₂N₄Zr |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD03427131 | |
| Melting Point: | Boiling Point: | 81 °C at 0.1 mmHg (lit.) | |
| Density: | 1.049 g/mL at 25 °C (lit.) | Storage Condition: | room temperature |
Product Description:
Used as a precursor in the chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of zirconium oxide. These films are essential in the semiconductor industry for manufacturing high-k dielectric materials in advanced electronic devices. It also finds application in the production of coatings that enhance the thermal and chemical stability of various materials. Additionally, it is employed in research and development for synthesizing novel zirconium-based compounds with potential uses in catalysis and material science.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 | 10-20 days | $885.99 |
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Tetrakis(ethylmethylamino)zirconium(IV)
Used as a precursor in the chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of zirconium oxide. These films are essential in the semiconductor industry for manufacturing high-k dielectric materials in advanced electronic devices. It also finds application in the production of coatings that enhance the thermal and chemical stability of various materials. Additionally, it is employed in research and development for synthesizing novel zirconium-based compounds with potential uses in catalysis and material science.
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