10-(4-Biphenylyl)-2-isopropyl-9-oxo-9H-thioxanthenium hexafluorophosphate
95%
- Product Code: 114971
CAS:
591773-92-1
Molecular Weight: | 552.511 g./mol | Molecular Formula: | C₂₈H₂₃F₆OPS |
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EC Number: | MDL Number: | ||
Melting Point: | Boiling Point: | ||
Density: | Storage Condition: | room temperature, dry |
Product Description:
Used primarily as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It generates acid upon exposure to UV light, which helps in the patterning process during lithography. The compound is valued for its high sensitivity and efficiency in producing fine patterns on silicon wafers. Additionally, it finds application in advanced materials research for developing high-resolution imaging systems. Its stability under processing conditions makes it suitable for use in deep UV and extreme UV lithography technologies.
Product Specification:
Test | Specification |
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Appearance | Pink Brown Powder |
Purity (%) | 94.5-100 |
Infrared Spectrum | Conforms To Structure |
NMR | Conforms To Structure |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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10.000 | 10-20 days | ฿790.00 |
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50.000 | 10-20 days | ฿2,880.00 |
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250.000 | 10-20 days | ฿9,680.00 |
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10-(4-Biphenylyl)-2-isopropyl-9-oxo-9H-thioxanthenium hexafluorophosphate
Used primarily as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It generates acid upon exposure to UV light, which helps in the patterning process during lithography. The compound is valued for its high sensitivity and efficiency in producing fine patterns on silicon wafers. Additionally, it finds application in advanced materials research for developing high-resolution imaging systems. Its stability under processing conditions makes it suitable for use in deep UV and extreme UV lithography technologies.
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