Tris(4-trifluoromethylphenyl)phosphine
99%
- Product Code: 121808
Alias:
Tris(4-trifluoromethylphenyl)phosphine
CAS:
13406-29-6
| Molecular Weight: | 466.28 g./mol | Molecular Formula: | CF₃C₆H₄₃P |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00058883 | |
| Melting Point: | 70-75 °C | Boiling Point: | |
| Density: | Storage Condition: | room temperature, dry |
Product Description:
Tris(4-trifluoromethylphenyl)phosphine is primarily utilized as a ligand in organometallic chemistry and catalysis. Its electron-withdrawing trifluoromethyl groups enhance the stability and reactivity of metal complexes, making it valuable in cross-coupling reactions, such as Suzuki-Miyaura and Heck reactions. It is also employed in the synthesis of fine chemicals and pharmaceuticals, where precise control over reaction pathways is essential. Additionally, its unique properties make it suitable for use in materials science, particularly in the development of advanced polymers and coatings with specific electronic or chemical resistance characteristics.
Product Specification:
| Test | Specification |
|---|---|
| Melting Point | 72-76 |
| Purity (GC) | 98.5-100 |
| Appearance | White Or Light Yellow Powder |
| Infrared Spectrum | Conforms To Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | ฿870.00 |
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| 1.000 | 10-20 days | ฿2,600.00 |
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| 5.000 | 10-20 days | ฿11,090.00 |
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Tris(4-trifluoromethylphenyl)phosphine
Tris(4-trifluoromethylphenyl)phosphine is primarily utilized as a ligand in organometallic chemistry and catalysis. Its electron-withdrawing trifluoromethyl groups enhance the stability and reactivity of metal complexes, making it valuable in cross-coupling reactions, such as Suzuki-Miyaura and Heck reactions. It is also employed in the synthesis of fine chemicals and pharmaceuticals, where precise control over reaction pathways is essential. Additionally, its unique properties make it suitable for use in materials science, particularly in the development of advanced polymers and coatings with specific electronic or chemical resistance characteristics.
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