5-Azoniaspiro[4.4]nonane Tetrafluoroborate
≥98%
- Product Code: 136322
CAS:
129211-47-8
| Molecular Weight: | 213.03 g./mol | Molecular Formula: | C₈H₁₆BF₄N |
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| Density: | Storage Condition: | Room temperature, dry |
Product Description:
Used as a photoacid generator in advanced photolithography processes, particularly in semiconductor manufacturing. Upon exposure to ultraviolet light, it releases strong acid, enabling precise patterning of microelectronic components. It is valued in resist formulations for high-resolution imaging due to its thermal stability and efficient acid generation. Also employed in polymer science for light-induced crosslinking and curing applications.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | $49.82 |
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| 1.000 | 10-20 days | $185.25 |
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5-Azoniaspiro[4.4]nonane Tetrafluoroborate
Used as a photoacid generator in advanced photolithography processes, particularly in semiconductor manufacturing. Upon exposure to ultraviolet light, it releases strong acid, enabling precise patterning of microelectronic components. It is valued in resist formulations for high-resolution imaging due to its thermal stability and efficient acid generation. Also employed in polymer science for light-induced crosslinking and curing applications.
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