Boc-methoxyphenyldiphenylsulfonium triflate
- Product Code: 149182
Alias:
(T-butoxycarbonylmethoxyphenyl)Diphenylsulfonium trifluoromethanesulfonate ester
CAS:
180801-55-2
| Molecular Weight: | 542.59 g./mol | Molecular Formula: | C₂₅H₂₅F₃O₆S₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD02683567 | |
| Melting Point: | 104 - 108 °C - lit. | Boiling Point: | |
| Density: | 1.26 g/cm3 | Storage Condition: | Room temperature |
Product Description:
Used as a photoacid generator (PAG) in advanced photolithography processes, particularly in semiconductor manufacturing. Upon exposure to deep ultraviolet (DUV) or extreme ultraviolet (EUV) light, it releases a strong acid that catalyzes chemical transformations in photoresist materials, enabling precise pattern development. Its Boc-protected structure enhances solubility and stability in resist formulations, while the sulfonium cation provides efficient acid generation with good thermal stability. Commonly employed in chemically amplified resists (CARs) for high-resolution patterning in microelectronics and integrated circuit production.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 50mg | 10-20 days | ฿2,990.00 |
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| 250mg | 10-20 days | ฿8,840.00 |
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Boc-methoxyphenyldiphenylsulfonium triflate
Used as a photoacid generator (PAG) in advanced photolithography processes, particularly in semiconductor manufacturing. Upon exposure to deep ultraviolet (DUV) or extreme ultraviolet (EUV) light, it releases a strong acid that catalyzes chemical transformations in photoresist materials, enabling precise pattern development. Its Boc-protected structure enhances solubility and stability in resist formulations, while the sulfonium cation provides efficient acid generation with good thermal stability. Commonly employed in chemically amplified resists (CARs) for high-resolution patterning in microelectronics and integrated circuit production.
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