Dodecamethylcyclohexasilane

≥97%(GC)

Product Code: 177997

CAS: 4098-30-0

Molecular Weight:	348.93 g./mol	Molecular Formula:	C₁₂H₃₆Si₆
EC Number:		MDL Number:	MFCD00053564
Melting Point:	229 °C(lit.)	Boiling Point:
Density:		Storage Condition:	Room temperature, seal, dry

Product Description: Used primarily as a precursor in the deposition of silicon-based thin films through chemical vapor deposition (CVD) processes. It is especially valuable in the semiconductor industry for creating high-purity silicon or silicon carbide layers on substrates. Its volatility and thermal stability allow for efficient film formation at relatively low temperatures, making it suitable for advanced microelectronic device fabrication. Additionally, it serves as a reagent in the synthesis of other organosilicon compounds used in specialty polymers and ceramics.

Sizes / Availability / Pricing:

Size	Availability	Price	Quantity
5g	10-20 days	฿23,990.00	+ -

Item	Document
Dodecamethylcyclohexasilane	[Product Info] [Specification] [MSDS]

Dodecamethylcyclohexasilane

Used primarily as a precursor in the deposition of silicon-based thin films through chemical vapor deposition (CVD) processes. It is especially valuable in the semiconductor industry for creating high-purity silicon or silicon carbide layers on substrates. Its volatility and thermal stability allow for efficient film formation at relatively low temperatures, making it suitable for advanced microelectronic device fabrication. Additionally, it serves as a reagent in the synthesis of other organosilicon compounds used in specialty polymers and ceramics.

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Dodecamethylcyclohexasilane

≥97%(GC)

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