EC-359
≥98%
- Product Code: 185789
CAS:
2012591-09-0
| Molecular Weight: | 540.68 g./mol | Molecular Formula: | C₃₆H₃₈F₂O₂ |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2-8°C |
Product Description:
Used in advanced semiconductor manufacturing processes, particularly in extreme ultraviolet (EUV) lithography. Acts as a key component in photoresist formulations, enabling high-resolution patterning of integrated circuits at nanometer scales. Offers improved sensitivity and reduced line edge roughness, which enhances the precision and yield in chip fabrication. Suitable for next-generation electronic devices requiring sub-7nm technology nodes.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 0.005 G | 10-20 days | ฿33,250.00 |
+
-
|
| 0.010 G | 10-20 days | ฿47,030.00 |
+
-
|
EC-359
Used in advanced semiconductor manufacturing processes, particularly in extreme ultraviolet (EUV) lithography. Acts as a key component in photoresist formulations, enabling high-resolution patterning of integrated circuits at nanometer scales. Offers improved sensitivity and reduced line edge roughness, which enhances the precision and yield in chip fabrication. Suitable for next-generation electronic devices requiring sub-7nm technology nodes.
| Mechanism | - |
| Appearance | - |
| Longevity | - |
| Strength | - |
| Storage | - |
| Shelf Life | - |
| Allergen(s) | - |
| Dosage (Range) | - |
| Recommended Dosage | - |
| Dosage (Per Day) | - |
| Recommended Dosage (Per Day) | - |
| Mix Method | - |
| Heat Resistance | - |
| Stable in pH range | - |
| Solubility | - |
| Product Types | - |
| INCI | - |
Purchase History for
Loading purchase history...
Cart
No products
Subtotal:
฿0.00
฿0.00
Total :