FT113
10mM in DMSO
- Product Code: 186894
CAS:
1630808-89-7
| Molecular Weight: | 409.41 g./mol | Molecular Formula: | C₂₂H₂₀FN₃O₄ |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | -20°C |
Product Description:
Used in advanced semiconductor manufacturing as a high-performance photoresist material, enabling precise patterning at nanoscale dimensions. Its high sensitivity and resolution make it ideal for extreme ultraviolet (EUV) lithography processes. Exhibits excellent etch resistance and thermal stability, supporting the fabrication of cutting-edge integrated circuits. Also employed in microelectromechanical systems (MEMS) and nanotechnology applications where fine feature control is critical.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1ml | 10-20 days | ฿7,210.00 |
+
-
|
FT113
Used in advanced semiconductor manufacturing as a high-performance photoresist material, enabling precise patterning at nanoscale dimensions. Its high sensitivity and resolution make it ideal for extreme ultraviolet (EUV) lithography processes. Exhibits excellent etch resistance and thermal stability, supporting the fabrication of cutting-edge integrated circuits. Also employed in microelectromechanical systems (MEMS) and nanotechnology applications where fine feature control is critical.
| Mechanism | - |
| Appearance | - |
| Longevity | - |
| Strength | - |
| Storage | - |
| Shelf Life | - |
| Allergen(s) | - |
| Dosage (Range) | - |
| Recommended Dosage | - |
| Dosage (Per Day) | - |
| Recommended Dosage (Per Day) | - |
| Mix Method | - |
| Heat Resistance | - |
| Stable in pH range | - |
| Solubility | - |
| Product Types | - |
| INCI | - |
Purchase History for
Loading purchase history...
Cart
No products
Subtotal:
฿0.00
฿0.00
Total :