Germanium n-butoxide

97%

  • Product Code: 190870
  CAS:    25063-27-8
Molecular Weight: 365.05 g./mol Molecular Formula: C₁₆H₃₆GeO₄
EC Number: MDL Number: MFCD00015347
Melting Point: Boiling Point: 143 °C
Density: 1.017 g/cm3 at 20 °C Storage Condition: Room temperature, seal, dry
Product Description: Used primarily as a precursor in the synthesis of germanium-containing thin films and coatings through sol-gel processes. These films are applied in optical coatings and semiconductor devices due to their favorable refractive index and electronic properties. Also employed in the preparation of organic-inorganic hybrid materials for advanced electronic and photonic applications. Its reactivity makes it suitable for chemical vapor deposition (CVD) techniques, where controlled decomposition yields high-purity germanium oxide layers. Additionally, it serves as a catalyst or intermediate in select organic transformations, particularly in condensation and esterification reactions.
Sizes / Availability / Pricing:
Size Availability Price Quantity
1.000 G 10-20 days ฿5,260.00
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Germanium n-butoxide
Used primarily as a precursor in the synthesis of germanium-containing thin films and coatings through sol-gel processes. These films are applied in optical coatings and semiconductor devices due to their favorable refractive index and electronic properties. Also employed in the preparation of organic-inorganic hybrid materials for advanced electronic and photonic applications. Its reactivity makes it suitable for chemical vapor deposition (CVD) techniques, where controlled decomposition yields high-purity germanium oxide layers. Additionally, it serves as a catalyst or intermediate in select organic transformations, particularly in condensation and esterification reactions.
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