1,2,3,4,5,6-hexamethylcyclotrisilazane
technical grade
- Product Code: 191825
CAS:
2587-46-4
| Molecular Weight: | 219.508 g./mol | Molecular Formula: | C₆H₂₁N₃Si₃ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00054845 | |
| Melting Point: | Boiling Point: | 56 °C at 5 mmHg | |
| Density: | Storage Condition: | 2-8°C |
Product Description:
Used as a precursor in the synthesis of silicon-based polymers and ceramics, particularly in the production of silicon carbonitride materials through pyrolysis. It serves as a key reagent in deposition processes for creating protective coatings and thin films in microelectronics due to its ability to form stable, high-purity layers at relatively low temperatures. Also employed in research for developing novel silazane-based networks with tailored thermal and mechanical properties. Its high reactivity and volatility make it suitable for vapor-phase applications in semiconductor manufacturing and advanced material fabrication.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 G | 10-20 days | ฿41,800.00 |
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1,2,3,4,5,6-hexamethylcyclotrisilazane
Used as a precursor in the synthesis of silicon-based polymers and ceramics, particularly in the production of silicon carbonitride materials through pyrolysis. It serves as a key reagent in deposition processes for creating protective coatings and thin films in microelectronics due to its ability to form stable, high-purity layers at relatively low temperatures. Also employed in research for developing novel silazane-based networks with tailored thermal and mechanical properties. Its high reactivity and volatility make it suitable for vapor-phase applications in semiconductor manufacturing and advanced material fabrication.
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