Hydroxylamine solution
1% in H2O
- Product Code: 192155
Alias:
HDA
CAS:
7803-49-8
| Molecular Weight: | 33.03 g./mol | Molecular Formula: | H₃NO |
|---|---|---|---|
| EC Number: | 232-259-2 | MDL Number: | MFCD00044522 |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2-8℃, away from light, dry |
Product Description:
Used as a reducing agent in chemical synthesis, particularly in the production of oximes from aldehydes and ketones, which are intermediates in the manufacture of pharmaceuticals and agrochemicals. Plays a key role in the synthesis of caprolactam, a precursor to nylon-6. Employed in analytical chemistry for the determination of carbonyl compounds and in metal ion analysis due to its complexing ability. Applied in semiconductor manufacturing for surface cleaning and modification of silicon wafers. Also utilized in the preparation of hydroxylamine-O-sulfonic acid, a reagent for introducing nitrogen functional groups in organic molecules.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 100ml | 10-20 days | ฿1,280.00 |
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| 500ml | 10-20 days | ฿4,200.00 |
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| 2.5L | 10-20 days | ฿17,600.00 |
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| 25ml | 10-20 days | ฿750.00 |
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Hydroxylamine solution
Used as a reducing agent in chemical synthesis, particularly in the production of oximes from aldehydes and ketones, which are intermediates in the manufacture of pharmaceuticals and agrochemicals. Plays a key role in the synthesis of caprolactam, a precursor to nylon-6. Employed in analytical chemistry for the determination of carbonyl compounds and in metal ion analysis due to its complexing ability. Applied in semiconductor manufacturing for surface cleaning and modification of silicon wafers. Also utilized in the preparation of hydroxylamine-O-sulfonic acid, a reagent for introducing nitrogen functional groups in organic molecules.
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