Hafnium chloride
99.5%
- Product Code: 194430
CAS:
13499-05-3
| Molecular Weight: | 320.30 g./mol | Molecular Formula: | Cl₄Hf |
|---|---|---|---|
| EC Number: | 236-826-5 | MDL Number: | MFCD00011034 |
| Melting Point: | 319 °C | Boiling Point: | |
| Density: | Storage Condition: | Room temperature, inert gas |
Product Description:
Used in the production of hafnium metal, which serves in nuclear reactor control rods due to its high neutron absorption capacity. Employed in chemical vapor deposition processes to create thin-film coatings for semiconductor devices. Acts as a catalyst in organic synthesis, particularly in polymerization and alkylation reactions. Also utilized in research for developing advanced materials with high thermal and mechanical stability.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿600.00 |
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| 5.000 | 10-20 days | ฿1,920.00 |
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| 25.000 | 10-20 days | ฿6,450.00 |
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| 100.000 | 10-20 days | ฿22,360.00 |
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| 500.000 | 10-20 days | ฿110,000.00 |
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Hafnium chloride
Used in the production of hafnium metal, which serves in nuclear reactor control rods due to its high neutron absorption capacity. Employed in chemical vapor deposition processes to create thin-film coatings for semiconductor devices. Acts as a catalyst in organic synthesis, particularly in polymerization and alkylation reactions. Also utilized in research for developing advanced materials with high thermal and mechanical stability.
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