Hafnium chloride
99.99%, white powder, zirconium ≤0.15%
- Product Code: 195535
CAS:
13499-05-3
| Molecular Weight: | 320.30 g./mol | Molecular Formula: | Cl₄Hf |
|---|---|---|---|
| EC Number: | 236-826-5 | MDL Number: | MFCD00011034 |
| Melting Point: | 432℃ (lit.) | Boiling Point: | |
| Density: | Storage Condition: | Room temperature, inert gas |
Product Description:
Used in the production of hafnium metal and as a precursor in chemical vapor deposition (CVD) processes to create hafnium-containing thin films for semiconductor devices. Plays a role in catalysis for certain organic reactions. Also utilized in the development of high-k dielectric materials in advanced microelectronics due to hafnium oxide's favorable insulating properties. Investigated for use in nuclear reactor control rods, leveraging hafnium’s high neutron absorption capability when derived into functional materials.
Product Specification:
| Test | Specification |
|---|---|
| Appearance | White powder |
| Purity (%) | 99.985-100 |
| ZR | <=0.15% |
| Infrared Spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 5g | 10-20 days | ฿2,690.00 |
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| 25g | 10-20 days | ฿9,220.00 |
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| 100g | 10-20 days | ฿32,500.00 |
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| 500g | 10-20 days | ฿151,900.00 |
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Hafnium chloride
Used in the production of hafnium metal and as a precursor in chemical vapor deposition (CVD) processes to create hafnium-containing thin films for semiconductor devices. Plays a role in catalysis for certain organic reactions. Also utilized in the development of high-k dielectric materials in advanced microelectronics due to hafnium oxide's favorable insulating properties. Investigated for use in nuclear reactor control rods, leveraging hafnium’s high neutron absorption capability when derived into functional materials.
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