Hafnium iodide
Super dry grade, 99.9% metals basis
- Product Code: 196291
CAS:
13777-23-6
| Molecular Weight: | 686.11 g./mol | Molecular Formula: | HfI₄ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00016128 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | Room temperature, dry, sealed |
Product Description:
Used in the production of high-purity hafnium metal through thermal decomposition, hafnium iodide plays a key role in the crystal bar process. It is also employed in specialized chemical vapor deposition (CVD) techniques to create hafnium-containing thin films for advanced semiconductor devices. These films are valued in microelectronics for their high dielectric constant, making them suitable for use in gate insulators of transistors. Additionally, hafnium iodide serves as a precursor in research settings for synthesizing hafnium-based compounds and nanomaterials with potential applications in catalysis and refractory materials.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1g | 10-20 days | ฿14,490.00 |
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Hafnium iodide
Used in the production of high-purity hafnium metal through thermal decomposition, hafnium iodide plays a key role in the crystal bar process. It is also employed in specialized chemical vapor deposition (CVD) techniques to create hafnium-containing thin films for advanced semiconductor devices. These films are valued in microelectronics for their high dielectric constant, making them suitable for use in gate insulators of transistors. Additionally, hafnium iodide serves as a precursor in research settings for synthesizing hafnium-based compounds and nanomaterials with potential applications in catalysis and refractory materials.
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