Isobutylgermane
97%
- Product Code: 198702
CAS:
768403-89-0
| Molecular Weight: | 132.78 g./mol | Molecular Formula: | C₄H₁₂Ge |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | -78 °C | Boiling Point: | 68 °C |
| Density: | Storage Condition: | 2-8°C |
Product Description:
Used as a precursor in metal-organic chemical vapor deposition (MOCVD) for depositing germanium-containing thin films. These films are critical in semiconductor manufacturing, especially in advanced transistor technologies and optoelectronic devices. Its volatility and thermal decomposition properties make it suitable for integrating germanium into silicon-based platforms, enhancing electron mobility in high-performance chips. Also explored in the synthesis of germanium nanoparticles and nanostructures for research in next-generation electronics and photovoltaics.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1g | 10-20 days | ฿77,840.00 |
+
-
|
Isobutylgermane
Used as a precursor in metal-organic chemical vapor deposition (MOCVD) for depositing germanium-containing thin films. These films are critical in semiconductor manufacturing, especially in advanced transistor technologies and optoelectronic devices. Its volatility and thermal decomposition properties make it suitable for integrating germanium into silicon-based platforms, enhancing electron mobility in high-performance chips. Also explored in the synthesis of germanium nanoparticles and nanostructures for research in next-generation electronics and photovoltaics.
| Mechanism | - |
| Appearance | - |
| Longevity | - |
| Strength | - |
| Storage | - |
| Shelf Life | - |
| Allergen(s) | - |
| Dosage (Range) | - |
| Recommended Dosage | - |
| Dosage (Per Day) | - |
| Recommended Dosage (Per Day) | - |
| Mix Method | - |
| Heat Resistance | - |
| Stable in pH range | - |
| Solubility | - |
| Product Types | - |
| INCI | - |
Purchase History for
Loading purchase history...
Cart
No products
Subtotal:
฿0.00
฿0.00
Total :