Trimethyl(methylcyclopentadienyl)platinum(IV)
Pt ≥61.1%
- Product Code: 198778
CAS:
94442-22-5
| Molecular Weight: | 319.3 g./mol | Molecular Formula: | C₅H₄CH₃Pt(CH₃)₃ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00079665 | |
| Melting Point: | 30-31 °C(lit.) | Boiling Point: | |
| Density: | Storage Condition: | 2-8°C, light-proof, inert gas |
Product Description:
Used primarily as a precursor in chemical vapor deposition (CVD) processes for depositing platinum-containing thin films. These films serve in microelectronics as conductive layers, especially in semiconductor devices and capacitors, due to platinum’s excellent stability and conductivity. The compound’s volatility and thermal decomposition characteristics make it suitable for forming high-purity platinum films at relatively low temperatures. It is also explored in the synthesis of platinum-based catalysts and in research settings for organoplatinum chemistry.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 250mg | 10-20 days | ฿24,020.00 |
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Trimethyl(methylcyclopentadienyl)platinum(IV)
Used primarily as a precursor in chemical vapor deposition (CVD) processes for depositing platinum-containing thin films. These films serve in microelectronics as conductive layers, especially in semiconductor devices and capacitors, due to platinum’s excellent stability and conductivity. The compound’s volatility and thermal decomposition characteristics make it suitable for forming high-purity platinum films at relatively low temperatures. It is also explored in the synthesis of platinum-based catalysts and in research settings for organoplatinum chemistry.
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