Ta solution
1000µg/ml,1.0 mol/L HF
- Product Code: 199388
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| Density: | Storage Condition: | 2~8℃ |
Product Description:
Used as a precursor in the production of tantalum-based thin films for semiconductor devices, particularly in high-k dielectrics for advanced memory and logic chips. Applied in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to form insulating layers with excellent thermal stability and dielectric properties. Also utilized in research for capacitor materials and microelectronic components requiring high performance under extreme conditions.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 100ml | 10-20 days | ฿3,900.00 |
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| 50ml | 10-20 days | ฿1,980.00 |
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Ta solution
Used as a precursor in the production of tantalum-based thin films for semiconductor devices, particularly in high-k dielectrics for advanced memory and logic chips. Applied in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to form insulating layers with excellent thermal stability and dielectric properties. Also utilized in research for capacitor materials and microelectronic components requiring high performance under extreme conditions.
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