Ta solution
10000µg/ml,1.0 mol/L HF
- Product Code: 199454
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| Density: | Storage Condition: | 2~8°C |
Product Description:
Used as a precursor in the production of tantalum-based thin films for semiconductor devices, particularly in high-k dielectrics and capacitors. Enables improved performance in microelectronics due to its ability to form stable, high-quality oxide layers. Also applied in coating technologies for corrosion-resistant surfaces and in the fabrication of advanced electronic components for aerospace and medical devices. Suitable for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 50ml | 10-20 days | ฿2,030.00 |
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Ta solution
Used as a precursor in the production of tantalum-based thin films for semiconductor devices, particularly in high-k dielectrics and capacitors. Enables improved performance in microelectronics due to its ability to form stable, high-quality oxide layers. Also applied in coating technologies for corrosion-resistant surfaces and in the fabrication of advanced electronic components for aerospace and medical devices. Suitable for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes.
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