MTX-211
95%
- Product Code: 204645
CAS:
1952236-05-3
| Molecular Weight: | 478.33 g./mol | Molecular Formula: | C₂₀H₁₄Cl₂FN₅O₂S |
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| Density: | Storage Condition: | 2-8°C |
Product Description:
MTX-211 is primarily used in advanced semiconductor manufacturing processes, specifically as a key component in extreme ultraviolet (EUV) photoresist formulations. It enables high-resolution patterning essential for producing sub-7nm node integrated circuits. Its unique molecular structure offers improved sensitivity and reduced line edge roughness, making it critical for next-generation chip fabrication. Additionally, MTX-211 contributes to enhanced etch resistance and pattern fidelity during plasma processing, supporting the development of high-performance logic and memory devices. Ongoing research explores its potential in directed self-assembly (DSA) lithography and quantum computing hardware fabrication.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 5mg | 10-20 days | ฿9,380.00 |
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| 25mg | 10-20 days | ฿24,990.00 |
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MTX-211
MTX-211 is primarily used in advanced semiconductor manufacturing processes, specifically as a key component in extreme ultraviolet (EUV) photoresist formulations. It enables high-resolution patterning essential for producing sub-7nm node integrated circuits. Its unique molecular structure offers improved sensitivity and reduced line edge roughness, making it critical for next-generation chip fabrication. Additionally, MTX-211 contributes to enhanced etch resistance and pattern fidelity during plasma processing, supporting the development of high-performance logic and memory devices. Ongoing research explores its potential in directed self-assembly (DSA) lithography and quantum computing hardware fabrication.
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