2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine

98%(GC)

Product Code: 208026

CAS: 3584-23-4

Molecular Weight:	Molecular Formula:	C₁₂H₇Cl₆N₃O
EC Number:	MDL Number:	MFCD00521486
Melting Point:	Boiling Point:
Density:	Storage Condition:	Room temperature, dry

Product Description: Used primarily as a photoacid generator in advanced photoresist formulations for semiconductor manufacturing. Upon exposure to ultraviolet light, it releases strong acids that catalyze chemical transformations in the resist, enabling precise pattern development during photolithography. It is especially effective in deep UV (248 nm) processes due to its high sensitivity and thermal stability. Also employed in specialty coatings and imaging materials where controlled acid generation is required. Its high chlorine content contributes to good plasma etch resistance in patterned films.

Sizes / Availability / Pricing:

Size	Availability	Price	Quantity
5.000	10-20 days	$72.85	+ -
25.000	10-20 days	$208.37	+ -

2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine

Used primarily as a photoacid generator in advanced photoresist formulations for semiconductor manufacturing. Upon exposure to ultraviolet light, it releases strong acids that catalyze chemical transformations in the resist, enabling precise pattern development during photolithography. It is especially effective in deep UV (248 nm) processes due to its high sensitivity and thermal stability. Also employed in specialty coatings and imaging materials where controlled acid generation is required. Its high chlorine content contributes to good plasma etch resistance in patterned films.

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2-(4-Methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine

98%(GC)

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