MR-L2
≥99%
- Product Code: 213139
CAS:
2374703-19-0
| Molecular Weight: | 441.71 g./mol | Molecular Formula: | C₁₉H₁₆Cl₃FN₄O |
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| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | -20°C |
Product Description:
Used in advanced photolithography processes for semiconductor manufacturing, enabling high-resolution patterning of microchips. Its high sensitivity and contrast make it ideal for producing fine features in next-generation integrated circuits. Commonly applied in EUV (extreme ultraviolet) lithography to support smaller node technologies. Also utilized in research for nanoimprint lithography due to its excellent pattern fidelity and etch resistance.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 5mg | 10-20 days | ฿34,070.00 |
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-
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| 10mg | 10-20 days | ฿57,610.00 |
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MR-L2
Used in advanced photolithography processes for semiconductor manufacturing, enabling high-resolution patterning of microchips. Its high sensitivity and contrast make it ideal for producing fine features in next-generation integrated circuits. Commonly applied in EUV (extreme ultraviolet) lithography to support smaller node technologies. Also utilized in research for nanoimprint lithography due to its excellent pattern fidelity and etch resistance.
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