(N-Methyl-N-phenylamino)triphenylphosphonium Iodide
95%
- Product Code: 217644
CAS:
34257-63-1
| Molecular Weight: | 495.34 g./mol | Molecular Formula: | C₂₅H₂₃INP |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00040544 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | Room temperature, dryness, inert gas storage |
Product Description:
Used as a photoacid generator in photopolymerization processes, particularly in advanced lithography for semiconductor manufacturing. Upon exposure to light, it releases acid that initiates polymerization or cross-linking in resist materials, enabling high-resolution patterning. Also employed in organic synthesis as a phosphonium-based reagent for Wittig-type reactions, facilitating carbon-carbon bond formation. Its thermal stability and solubility in organic solvents make it suitable for thin-film applications and optoelectronic device fabrication.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 50mg | 10-20 days | ฿310.00 |
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| 250mg | 10-20 days | ฿760.00 |
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| 1g | 10-20 days | ฿2,550.00 |
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(N-Methyl-N-phenylamino)triphenylphosphonium Iodide
Used as a photoacid generator in photopolymerization processes, particularly in advanced lithography for semiconductor manufacturing. Upon exposure to light, it releases acid that initiates polymerization or cross-linking in resist materials, enabling high-resolution patterning. Also employed in organic synthesis as a phosphonium-based reagent for Wittig-type reactions, facilitating carbon-carbon bond formation. Its thermal stability and solubility in organic solvents make it suitable for thin-film applications and optoelectronic device fabrication.
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