Nickel(II) trifluoroacetylacetonate dihydrate
98%
- Product Code: 219987
CAS:
14324-83-5
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| Density: | Storage Condition: | Room temperature |
Product Description:
Used as a precursor in chemical vapor deposition (CVD) processes to produce nickel-containing thin films and coatings. These films are applied in electronics, catalysis, and magnetic materials due to their conductive and catalytic properties. Also serves as a catalyst or catalyst precursor in organic synthesis, especially in reactions requiring nickel in a well-defined coordination environment. Its volatility and thermal stability make it suitable for deposition techniques requiring controlled decomposition. Additionally, used in research for preparing functional nanomaterials and metal-organic frameworks (MOFs) where nickel centers are required.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 100mg | 10-20 days | ฿2,130.00 |
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| 250mg | 10-20 days | ฿3,250.00 |
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| 1g | 10-20 days | ฿8,770.00 |
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| 5g | 10-20 days | ฿28,630.00 |
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Nickel(II) trifluoroacetylacetonate dihydrate
Used as a precursor in chemical vapor deposition (CVD) processes to produce nickel-containing thin films and coatings. These films are applied in electronics, catalysis, and magnetic materials due to their conductive and catalytic properties. Also serves as a catalyst or catalyst precursor in organic synthesis, especially in reactions requiring nickel in a well-defined coordination environment. Its volatility and thermal stability make it suitable for deposition techniques requiring controlled decomposition. Additionally, used in research for preparing functional nanomaterials and metal-organic frameworks (MOFs) where nickel centers are required.
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