Nickel 1,1,1-trifluoro 2,4-pentanedionatedihydrate

  • Product Code: 220703
  CAS:    55534-89-9
Molecular Weight: 400.90 g./mol Molecular Formula: C₁₀H₈F₆NiO₄·₂H₂O
EC Number: MDL Number: MFCD00150656
Melting Point: Boiling Point:
Density: Storage Condition: Room temperature, seal, dry
Product Description: Used as a precursor in chemical vapor deposition (CVD) processes to produce nickel-containing thin films for electronic devices. It serves as a nickel source in catalysis, particularly in reactions requiring soluble and stable nickel complexes. Its volatility and thermal stability make it suitable for depositing nickel oxide or metallic nickel layers in semiconductor manufacturing. Also applied in research for synthesizing nanomaterials and functional coatings due to controlled nickel release. The compound’s ligand structure enhances solubility and reactivity in organic and aqueous systems, broadening its use in material science and industrial chemistry.
Sizes / Availability / Pricing:
Size Availability Price Quantity
250mg 10-20 days £38.07
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1g 10-20 days £101.14
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5g 10-20 days £353.43
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Nickel 1,1,1-trifluoro 2,4-pentanedionatedihydrate
Used as a precursor in chemical vapor deposition (CVD) processes to produce nickel-containing thin films for electronic devices. It serves as a nickel source in catalysis, particularly in reactions requiring soluble and stable nickel complexes. Its volatility and thermal stability make it suitable for depositing nickel oxide or metallic nickel layers in semiconductor manufacturing. Also applied in research for synthesizing nanomaterials and functional coatings due to controlled nickel release. The compound’s ligand structure enhances solubility and reactivity in organic and aqueous systems, broadening its use in material science and industrial chemistry.
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