Silicon dioxide

99.99% metals basis, D50=20μm

  • Product Code: 232549
  CAS:    60676-86-0
Molecular Weight: 60.08 g./mol Molecular Formula: SiO₂
EC Number: 262-373-8 MDL Number: MFCD00011232
Melting Point: 1610 °C(lit.) Boiling Point:
Density: Storage Condition: Room temperature
Product Description: Used as a flow agent in powdered foods like spices and non-dairy creamers to prevent caking. Acts as a thickening and suspending agent in paints, coatings, and inks. Serves as a reinforcing filler in rubber and plastic products to improve strength and durability. Employed in pharmaceuticals as a glidant in tablet manufacturing to ensure consistent powder flow. Utilized in cosmetics for its absorbent properties, helping control shine in powders and foundations. Functions as a desiccant in moisture-absorbing packets for electronics, food, and药品 packaging. Key component in glass, ceramics, and cement production due to its structural and thermal stability. Used in water filtration systems to remove impurities and suspended solids. Applied in semiconductor manufacturing as an insulating layer in integrated circuits. Common substrate material in chromatography and microfluidic devices for research and diagnostics.
Sizes / Availability / Pricing:
Size Availability Price Quantity
250g 10-20 days ฿1,980.00
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1kg 10-20 days ฿5,100.00
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5kg 10-20 days ฿24,880.00
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Silicon dioxide
Used as a flow agent in powdered foods like spices and non-dairy creamers to prevent caking. Acts as a thickening and suspending agent in paints, coatings, and inks. Serves as a reinforcing filler in rubber and plastic products to improve strength and durability. Employed in pharmaceuticals as a glidant in tablet manufacturing to ensure consistent powder flow. Utilized in cosmetics for its absorbent properties, helping control shine in powders and foundations. Functions as a desiccant in moisture-absorbing packets for electronics, food, and药品 packaging. Key component in glass, ceramics, and cement production due to its structural and thermal stability. Used in water filtration systems to remove impurities and suspended solids. Applied in semiconductor manufacturing as an insulating layer in integrated circuits. Common substrate material in chromatography and microfluidic devices for research and diagnostics.
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